| 摘要 |
An array substrate of a semi-transmissive type LCD and a method for manufacturing the same are provided to secure an effective area for forming embossing patterns in a reflective region while the number of manufacturing masks is not increased, thereby improving the light reflecting efficiency. A unit pixel is divided into a reflective region(RR), a transmissive region(TR), and a neighboring region. A thin film transistor(120) is disposed in the reflective region, wherein the thin film transistor has a drain electrode(DE), which is extended from the reflective region to the neighboring region. A passivation layer(130) covers the reflective region and the transmissive region, and has a contact hole for exposing an end portion of the drain electrode in the neighboring region. A transparent electrode(160) is disposed on the passivation layer correspondingly to the transmissive region. An organic pattern(150) is disposed on the passivation layer correspondingly to the reflective region, wherein the organic layer has embossing patterns. A reflective electrode(160) covers the organic pattern, wherein the reflective electrode is extended from the reflective region to the transmissive region. The reflective electrode is contacted with the drain electrode through the contact hole and contacted with the transparent electrode. |
