| 摘要 |
An ion implantation apparatus is provided to precisely perform a Y-tilt zero inspection by installing an X-axis tilting part between a disk driving part and a Y-axis driving part. A disk(60) on which a wafer is placed is installed in a process chamber(50) of high vacuum, capable of rotating. The disk is rotated by a disk driving part(70). An X-axis tilting part(80) horizontally rotates the disk driving part by a predetermined angle. A Y-axis driving part(90) vertically rotates the X-axis driving part. A Y-axis scan part(100) moves up the Y-axis driving part by a predetermined height. The disk driving part includes a driving unit for rotating the disk wherein the driving unit is connected to a corresponding surface to the surface of the disk on which the wafer is placed.
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