发明名称 |
Method to trim and smooth high index contrast waveguide structures |
摘要 |
Formation, through etching, of structures whose minimum width is less than can be achieved by optical means alone has been achieved by inserting a layer of sandwiching material between the photoresist (or hard mask if used) and the structure. By adjustment of the relative etch rates of this layer and the structure, a uniform lateral width reduction and surface smoothing of the structure is achieved.
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申请公布号 |
US7248773(B2) |
申请公布日期 |
2007.07.24 |
申请号 |
US20060633335 |
申请日期 |
2006.12.04 |
申请人 |
AGENCY FOR SCIENCE, TECHNOLOGY, AND RESEARCH |
发明人 |
CHANG CHANG KUO;TSANG CHI FO;DOAN MY THE;BADAM RAMANA MURTHY;BLIZNETSOV VLADIMIR |
分类号 |
H01L21/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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