EQUIPMENT FOR CLEANING SEMICONDUCTOR DEVICE

摘要

Equipment for cleaning a semiconductor is provided to uniformly mix a chemical solution with a diluent solution by including a flowrate control valve for continuously supplying a diluent solution to a cleaning bath such that the diluent solution is necessary for diluting a chemical solution put into the cleaning bath. A cleaning process is performed on a semiconductor substrate in a cleaning bath. A chemical solution is supplied to the cleaning bath by a chemicals supply part. A diluent solution for diluting the chemical solution supplied from the chemicals supply part is supplied to the cleaning bath by a diluent supply part. A diluent supply line(140) in which the diluent solution flows is installed between the diluent supply part and the cleaning bath. At least one flowrate control valve(150) is installed in the diluent supply line to control the flowrate of the diluent solution flowing continuously to the cleaning bath through the diluent supply line. The flowrate control valve has a smaller inner diameter than that of the diluent supply line.