发明名称 SYSTEM AND METHOD FOR SUPPLING CHEMICAL
摘要 A system for supplying chemicals is provided to facilitate management and preventive maintenance of a system by reducing the constitution of a chemicals supply system. A chemicals supply apparatus supplies chemicals to a first process chamber(22) and a second process chamber(24) disposed on the first process chamber. The chemicals are transferred from the chemicals supply apparatus to the first process chamber by a first chemicals supply line(120). The chemicals are transferred from the chemicals supply apparatus to the second process chamber by a second chemicals supply line(140). The supply pressures of the chemicals supplied to the first and second process chambers are the same. The chemicals supply apparatus can include a storage receptacle(114) for storing chemicals. An inert gas is supplied to the storage receptacle to pressurize the storage receptacle.
申请公布号 KR20070076085(A) 申请公布日期 2007.07.24
申请号 KR20060005056 申请日期 2006.01.17
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 YOON, YANG LO;KIM, YONG SEOK;LEE, JOUNG SUN;KIM, TAE KYUNG
分类号 H01L21/00 主分类号 H01L21/00
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