发明名称 Electric circuit and semiconductor device
摘要 As for a transistor, overlapped are factors such as a variation of a gate insulation film which occurs due to a difference of a manufacturing process and a substrate used and a variation of a crystalline state in a channel forming region and thereby, there occurs a variation of a threshold voltage and mobility of a transistor. This invention provides an electric circuit which used a rectification type device in which an electric current is generated only in a single direction, when an electric potential difference was applied to electrodes at both ends of the device. Then, the invention provides an electric circuit which utilized a fact that, when a signal voltage is inputted to one terminal of the rectification type device, an electric potential of the other terminal becomes an electric potential offset only by the threshold voltage of the rectification type device.
申请公布号 US7248031(B2) 申请公布日期 2007.07.24
申请号 US20040006589 申请日期 2004.12.08
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 KIMURA HAJIME;WATANABE YASUKO
分类号 G05F5/00;G05F1/618;H02M7/538;H02P8/00;H03K17/14 主分类号 G05F5/00
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