发明名称 |
Pattern inspection apparatus and method and workpiece tested thereby |
摘要 |
A pattern inspection apparatus capable of finding temporary emphatic portions in the process of transfer-and-development simulation of the image of a workpiece being tested is disclosed. This apparatus includes a first storage unit for retaining therein the pattern of an image captured from a workpiece under testing, a simulator for applying transfer/development simulation to the captured image pattern, and a second storage unit for storing the pattern of an image which is being presently simulated during the transfer/development simulation of the originally captured image pattern. A comparison processor handles as a pattern to be tested a pattern of the presently simulated or "midstream" image of the captured image while using a pattern to be compared as a fiducial pattern and compares the to-be-tested image to the fiducial pattern. A pattern inspection method is also disclosed.
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申请公布号 |
US2007165938(A1) |
申请公布日期 |
2007.07.19 |
申请号 |
US20060378644 |
申请日期 |
2006.03.20 |
申请人 |
ADVANCED MASK INSPECTION TECHNOLOGY INC. |
发明人 |
MATSUMURA KENICHI;SAITO YASUKO |
分类号 |
G06K9/00;G01N21/956;G03F1/84 |
主分类号 |
G06K9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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