发明名称 Semiconductor array and method for manufacturing a semiconductor array
摘要 Semiconductor array, with an element region ( 400 ), with a conductive substrate ( 100 ), with a buried insulation layer ( 200 ), which isolates the element region ( 400 ) from the conductive substrate ( 100 ), with at least one trench ( 700 ), which is filled with an insulation material ( 710 ) and which isolates at least one element ( 1000 ) in the element region ( 400 ) from other elements in the element region ( 400 ), with an electrical conductor ( 750 ), which is connected conductively to the conductive substrate ( 100 ), wherein the electrical conductor ( 750 ) is disposed within the trench ( 700 ) isolated by the insulation material ( 710 ), and wherein the trench ( 700 ) is formed within a recess ( 600 ) in a surface. Furthermore, a method for manufacturing a semiconductor array is provided.
申请公布号 US2007164443(A1) 申请公布日期 2007.07.19
申请号 US20060528398 申请日期 2006.09.28
申请人 ATMEL GERMANY GMBH 发明人 FLORIAN TOBIAS;GRAF MICHAEL;SCHWANTES STEFAN
分类号 H01L23/48 主分类号 H01L23/48
代理机构 代理人
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