| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lactone-containing compound that is useful as a functional material and a raw material of medicines/agrochemicals and, in particular, very useful as a monomer for manufacturing a base resin of a radiation-sensitive resist composition that is excellently transparent to a radiation having a wavelength of 500 nm or less, particularly a wavelength of 300 nm or less and exhibits good developing properties. <P>SOLUTION: The lactone-containing compound is represented by general formula (1) (wherein A<SP>1</SP>is a polymerizable functional group having a carbon-carbon double bond; R<SP>1</SP>is a linear, branched or cyclic 1-10C monovalent hydrocarbon group having a part or the whole of hydrogen atoms on the constituent carbons thereof substituted with a fluorine atom; and W is either one of CH<SB>2</SB>, an oxygen atom and a sulfur atom). When this polymer is used as the base resin of the radiation-sensitive resist composition, it exhibits high resolution and is suppressed in elution into water as an immersion medium and infiltration of water and the polymer compound is very effective for precise microfabrication as a resist material. <P>COPYRIGHT: (C)2007,JPO&INPIT |
