| 摘要 |
Embodiments relate to a SRAM, in which a well isolation method may be applied so that an N-well and a P-well are separated from each other and that well walls of opposite conductive types are formed on facing sides. Also, the active regions of NMOS and PMOS may be connected to each other and the contacts of a PMOS drain and an NMOS source may be united to one so that the contacts are moved to the active regions of wide parts. A size of the common contact may be one to two times the size of a contact defined by a design rule. The active region may have a round bent part. The common contacts are arranged to be asymmetrical with each other. Therefore, it may be possible to secure the process margins of the active regions and the contacts, to improve a leakage current characteristic, and to improve yield. Also, it may be possible to prevent the dislocation of the active region and to omit a conventional thermal treatment process so that it may be possible to simplify processes and to reduce manufacturing cost.
|
