发明名称 ELECTROSTATIC DEFLECTION SYSTEM WITH IMPEDANCE MATCHING FOR HIGH POSITIONING ACCURACY
摘要 An apparatus and method for deflecting electron beams (301) with high precision and high throughput. At least one electrode (302, 312) of a deflecting capacitor is connected to a signal source (303, 313) via a coaxial cable (304, 314). A termination resistor (306, 316 is further connected to the coaxial cable and the electrode at the joint (307, 317) of the coaxial cable and the electrode. The termination resistor has a resistance matched to the impedance of the coaxial cable and the electrode has an impedance matched to half of the impedance of the coaxial. The deflecting capacitors of the present invention have a minimized loss of precision due to eddy current. The spacing of electrodes in the deflecting capacitors is reduced by a factor of approximately two compared to the state-the-art system.
申请公布号 WO2007041057(B1) 申请公布日期 2007.07.19
申请号 WO2006US37218 申请日期 2006.09.26
申请人 APPLIED MATERIALS, INC.;BULLER, BENYAMIN;DEVORE, WILLIAM J.;FROSIEN, JUERGEN;MIRRO, JR., EUGENE;PEARCE-PERCY, HENRY;WINKLER, DIETER 发明人 BULLER, BENYAMIN;DEVORE, WILLIAM J.;FROSIEN, JUERGEN;MIRRO, JR., EUGENE;PEARCE-PERCY, HENRY;WINKLER, DIETER
分类号 H01J37/147 主分类号 H01J37/147
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