METHOD FOR FORMING THIN FILM, AND THIN FILM

摘要

PROBLEM TO BE SOLVED: To provide a method for forming a thin film, by which a uniform thin film having high performance can be efficiently formed even at ordinary temperature, and to provide the thin film obtained by the same. SOLUTION: The method for forming the thin film comprises imparting nanoparticle on a base material and subjecting the nanoparticle imparted on the base material to an atmospheric pressure plasma treatment. The atmospheric pressure plasma treatment is characterized by supplying a gas between opposing electrodes under atmospheric pressure or a pressure close to the atmospheric pressure, converting the gas into an excited gas by generating a high frequency electric field between the electrodes, and then exposing the nanoparticle imparted on the base material to the excited gas. COPYRIGHT: (C)2007,JPO&INPIT