发明名称 Metal-polishing liquid and chemical-mechanical polishing method using the same
摘要 A metal-polishing liquid includes colloidal silica and a compound represented by Formula (I) or a compound represented by Formula (II). The colloidal silica is substituted by aluminum atoms at least one portion of the silicon atoms on the surfaces thereof. In Formula (I), R<SUP>1 </SUP>represents an alkyl group, alkynyl group, alkenyl group, allyl group or aryl group; R<SUP>2 </SUP>represents hydrogen atom, an alkyl group, alkynyl group, alkenyl group, allyl group or aryl group; m represents an integer from 0 to 6. In Formula (II), R<SUP>3 </SUP>represents an alkyl group or aryl group; n represents an integer from 1 to 30. <?in-line-formulae description="In-line Formulae" end="lead"?>R<SUP>1</SUP>-OOC-(CH<SUB>2</SUB>)<SUB>m</SUB>-COO-R<SUP>2</SUP> Formula (I)<?in-line-formulae description="In-line Formulae" end="tail"?> <?in-line-formulae description="In-line Formulae" end="lead"?>R<SUP>3</SUP>-O-(CH<SUB>2</SUB>CH<SUB>2</SUB>O)<SUB>n</SUB>-SO<SUB>3</SUB>H Formula (II)<?in-line-formulae description="In-line Formulae" end="tail"?>
申请公布号 US2007167016(A1) 申请公布日期 2007.07.19
申请号 US20070701403 申请日期 2007.02.02
申请人 FUJIFILM CORPORATION 发明人 YAMASHITA KATSUHIRO
分类号 H01L21/461;B24B37/00;C09K3/14;H01L21/304 主分类号 H01L21/461
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