| 摘要 |
Disclosed herein is an apparatus for supplying a liquefied chemical gas comprising a vaporizer disposed within a fabrication plant, the vaporizer adapted to receive the liquefied chemical gas and output a vaporized chemical gas, a purge vessel connected to and in fluid communication with the vaporizer, and wherein the vaporizer is adapted to purge a volume of the liquefied chemical gas and the purge vessel is adapted to receive the volume of liquefied chemical gas. Other embodiments and methods are described herein.
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