发明名称 METHOD OF MANUFACTURING POLISHING PAD
摘要 <P>PROBLEM TO BE SOLVED: To provide the method of manufacturing a product for polishing or planarizing a work item. <P>SOLUTION: There is provided the method of manufacturing a pad which is a polishing pad that is used with polishing slurry and being for polishing or planarizing the front surface of an artifact and which comprises a supermolecule matrix impregnated with a plurality of supermolecule fine elements, which per se, do not substantively polish the surface of the artifact. The method comprises steps of (1) for allocating the supermolecule fine element to a prepolymer for forming the supermolecule matrix, (2) for allowing the prepolymer to be a product by curing the prepolymer to which the supermolecule fine element is allocated, and (3) for cutting the product. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007184638(A) 申请公布日期 2007.07.19
申请号 JP20070078767 申请日期 2007.03.26
申请人 ROHM & HAAS ELECTRONIC MATERIALS CMP HOLDINGS INC 发明人 REINHARDT HEINZ F;ROBERTS JOHN V H;MACLAINE HARRY GEORGE;JENSEN ELMIEL WILLIAM;BADINGER WILLIAM D
分类号 H01L21/304;B24B37/20 主分类号 H01L21/304
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