| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing wheel capable of preventing contamination, excellent in abrasive grain holding force, eliminating local contact to a cutting material and uniforming its contact. SOLUTION: This polishing wheel 1 is constituted as columnar diamond 3 is arranged on a disc type base 2, a central part of a surface of the base 2 is a flat surface, and a curved surface is formed so that thickness of the base 2 becomes thinner toward an outer peripheral end in a region to an outer periphery. The base 2 is formed of resin, and it is possible to use resin with silicon rubber, polypropylene, nylon, teflon, polyvinylchloride, polyethylene, phenol resin and polyimide resin as its main components as the resin. COPYRIGHT: (C)2007,JPO&INPIT
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