发明名称 VERSATILE SEMI-TOROIDAL PROCESSING FURNACE WITH AUTOMATIC AND RECONFIGURABLE WAFER EXCHANGE
摘要 The present invention comprises a fully automated, fabrication compliant furnace with the advantages of the horizontal most of the advantages of the vertical furnace. One embodiment of the present invention is that it implements a multi-degree motion robot arm to move wafers from a loading area to a WIP station where the wafer are then loaded into wafer boats on a rotating cantilever system or directly onto a specialized and reconfigurable paddle designed to hold wafers: The wafers may be loaded in the horizontal processing position as well as the vertical processing position. Multiple levels of the semi-toroidal horizontal processors allow for multiple batches of wafers to be loaded, processed, cooled, and unloaded by the robot arm. The present invention reduces the footprint of the traditional horizontal or vertical furnaces, increases capacity and throughput, and allows for direct tube transfer.
申请公布号 WO2006017163(A3) 申请公布日期 2007.07.19
申请号 WO2005US24237 申请日期 2005.07.09
申请人 DIAMOND SEMICONDUCTOR, INC.;BAYNE, CHRISTOPHER, J. 发明人 BAYNE, CHRISTOPHER, J.
分类号 F26B19/00;F27D11/00 主分类号 F26B19/00
代理机构 代理人
主权项
地址