| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new technique that obtains at least either the luminous-exposure offset quantity or the focus offset quantity. <P>SOLUTION: In a first step, the information of the shape of a pattern formed on a substrate is obtained, by using the exposure system regarding each value of at least one of a luminous exposure and a place. In a second step, a library indicating a relation between the information of the first step and at least one information in the luminous exposure in the exposure system and the place of the substrate for the focusing is prepared by using a KL development. In a third step, the information of the shape of the pattern formed on the substrate is acquired by using the exposure system, while using the luminous exposure and the place of the substrate for the focusing as known values, respectively. At a fourth step, at least one offset quantity in the luminous exposure, and the place of the substrate for the focusing is acquired on the basis of the information of the third step and the information of the library. A method having the first step, the second step, the third step, and the fourth step is provided. <P>COPYRIGHT: (C)2007,JPO&INPIT |
