发明名称 |
Apparatus for treating substrate |
摘要 |
There is provided an apparatus for treating a substrate using a plurality of treatment solutions in sequence. The apparatus includes treatment liquid collecting vessels for separately collecting used treatment solutions, and an exhaust member for separately discharging pollutant gases generated during a process.
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申请公布号 |
US2007163711(A1) |
申请公布日期 |
2007.07.19 |
申请号 |
US20060524320 |
申请日期 |
2006.09.21 |
申请人 |
KOO KYO-WOOG;KIM JEONG-MIN |
发明人 |
KOO KYO-WOOG;KIM JEONG-MIN |
分类号 |
H01L21/306 |
主分类号 |
H01L21/306 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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