| 发明名称 |
COMPOUND, CLEANING SOLUTION, SYSTEM AND METHOD FOR CLEANING SUBSTRATE |
| 摘要 |
PROBLEM TO BE SOLVED: To provide a technique for removing contaminants from the surface of a wafer. SOLUTION: A cleaning compound is provided with about 0.5 wt.% to about 10 wt.% of a fatty acid dispersed in water, and an amount of a base capable of making a pH of the fatty acid water solution higher than a level where about 50% of the dispersed fatty acid is ionized. COPYRIGHT: (C)2007,JPO&INPIT
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| 申请公布号 |
JP2007184600(A) |
申请公布日期 |
2007.07.19 |
| 申请号 |
JP20060351427 |
申请日期 |
2006.12.27 |
| 申请人 |
LAM RES CORP |
发明人 |
FREER ERIK M;DE LARIOS JOHN M;MIKHAYLICHENKO KATRINA;RAVKIN MICHAEL;KOROLIK MIKHAIL;REDEKER FRED C |
| 分类号 |
H01L21/304;C11D1/04;C11D1/12;C11D1/34;C11D3/20;C11D3/26;C11D3/30;C11D3/32 |
主分类号 |
H01L21/304 |
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