| 摘要 |
To reduce noise between a power supply wiring and ground wiring especially in a small, high-density semiconductor device for high-speed operation. A semiconductor device having a second dielectric layer 5 made of dielectric material of which the dielectric loss tan 6 is at least 0.2 and interposed between a power supply wiring layer 6 electrically connected to a semiconductor chip and a ground wiring layer 4, so composed that a dielectric loss generated in the second dielectric layer 5 acts as a low pass filter of the power supply wiring layer 6, and having a first dielectric layer 3 made of dielectric material whose dielectric loss is less than the dielectric loss tan 6 of the second dielectric layer 5 and interposed between a signal wiring layer 2 electrically connected to the semiconductor chip and the ground wiring layer 4. |
