| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a cleaning structure for a lithographic apparatus module in a collector. <P>SOLUTION: The cleaning structure includes a hydrogen radical source constituted to provide a gas including a hydrogen radical to at least a part of a module; and a pump constituted to carry out a pump exhaust of the gas from the module, so that a flow rate of the gas including the hydrogen radical provided through at least the part of the module may become at least 1 m/s. Moreover, the cleaning structure can be equipped with a gas shutter constituted to adjust a flow of the gas including the hydrogen radical to at least the part of the module, a buffer volume of at least 1 m<SP>3</SP>communicating with the module, and a pump constituted to provide a gas pressure between 0.001 mbar (0.1 Pa) to 1 mbar (100 Pa) to the buffer volume. The cleaning structure can further include a gas return system. <P>COPYRIGHT: (C)2007,JPO&INPIT |
