APPARATUS AND METHOD FOR DEPOSITING A MATERIAL ON A SUBSTRATE

摘要

Apparatus and a method for depositing a material on a substrate (G) utilizes a distributor (22) including a permeable member (24) through which a carrier gas (38) and a material (40) are.-^assed to provide a vapor that is deposited on a conveyed substrate. A secondary gas (74) can be provided to promote uniform distribution of the material on the substrate (G).