发明名称 |
Gas distribution apparatuses and methods for controlling gas distribution apparatuses |
摘要 |
A gas distribution apparatus includes a first plate and a second plate comprising a plurality of first openings and second openings, respectively. The second plate is disposed in overlapping relation with the first plate. Overlaps of the first openings and the second openings form third openings, which provide a first gas distribution pattern at a first orientation of the plates relative to one another and a second gas distribution pattern at a second orientation different than the first orientation.
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申请公布号 |
US2007163716(A1) |
申请公布日期 |
2007.07.19 |
申请号 |
US20060335455 |
申请日期 |
2006.01.19 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
HSIAO YI-LI;YU CHEN-HUA;WANG JEAN;SHEU LAWRANCE |
分类号 |
H01L21/306;C23C16/00;C23F1/00 |
主分类号 |
H01L21/306 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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