发明名称 Gas distribution apparatuses and methods for controlling gas distribution apparatuses
摘要 A gas distribution apparatus includes a first plate and a second plate comprising a plurality of first openings and second openings, respectively. The second plate is disposed in overlapping relation with the first plate. Overlaps of the first openings and the second openings form third openings, which provide a first gas distribution pattern at a first orientation of the plates relative to one another and a second gas distribution pattern at a second orientation different than the first orientation.
申请公布号 US2007163716(A1) 申请公布日期 2007.07.19
申请号 US20060335455 申请日期 2006.01.19
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 HSIAO YI-LI;YU CHEN-HUA;WANG JEAN;SHEU LAWRANCE
分类号 H01L21/306;C23C16/00;C23F1/00 主分类号 H01L21/306
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