发明名称 |
Manganese Alloy Sputtering Target and Method for Producing the Same |
摘要 |
A manganese alloy sputtering target characterized in that oxygen is 1000 ppm or less, sulfur is 200 ppm or less and a forged texture is provided, and a method for producing a forged manganese alloy target stably by eliminating the drawbacks of manganese alloy that it is susceptible to cracking and has a low rupture strength. A manganese alloy sputtering target which can form a thin film exhibiting high characteristics and high corrosion resistance while suppressing generation of nodules or particles is thereby obtained.
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申请公布号 |
US2007163878(A1) |
申请公布日期 |
2007.07.19 |
申请号 |
US20070687765 |
申请日期 |
2007.03.19 |
申请人 |
NIPPON MINING & METALS CO., LTD. |
发明人 |
NAKAMURA YUICHIRO |
分类号 |
C22F1/02;C23C14/00;B21J5/02;B21J5/08;C22C5/02;C22C5/04;C22C22/00;C22F1/00;C22F1/16;C22F1/18;C23C14/34;G11B5/39;G11B5/65;G11B5/851;H01L43/12 |
主分类号 |
C22F1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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