发明名称 Stress-relief layer and stress-compensation collar in contact arrays, and processes of making same
摘要 A stress-relief layer is formed by dispensing a polymer upon a substrate lower surface under conditions to partially embed a solder bump that is disposed upon the lower surface. The stress-relief layer flows against the solder bump. A stress-compensation collar is formed on a board to which the substrate is mated and the SCC partially embeds the solder bump. An article that exhibits a stress-relief layer and a stress-compensation collar is also included. A computing system that includes a stress-relief layer and a stress-compensation collar is also included.
申请公布号 US7244634(B2) 申请公布日期 2007.07.17
申请号 US20040815968 申请日期 2004.03.31
申请人 INTEL CORPORATION 发明人 SUH DAEWOONG;JAYARAMAN SAIKUMAR;BIN BASIRON MOHD ERWAN P.;LIM SHEAU HOOI;CHIN YOONG TATT P.
分类号 H01L21/00;H01L21/44;H01L23/498;H05K1/02;H05K3/34 主分类号 H01L21/00
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