发明名称 Method of compensating for a volumetric shrinkage of a material disposed upon a substrate to form a substantially planar structure therefrom
摘要 The present invention provides a method of planarizing a substrate with a template spaced-apart from the substrate having a liquid disposed therebetween, the method including: contacting the liquid with the template forming a first shape therein; and impinging radiation upon the liquid causing a reduction in volume of the liquid, with the first shape compensating for the reduction in volume such that upon impinging the actinic radiation upon the liquid, the liquid forms a contoured layer having a substantially planar shape.
申请公布号 US7244386(B2) 申请公布日期 2007.07.17
申请号 US20040951014 申请日期 2004.09.27
申请人 MOLECULAR IMPRINTS, INC. 发明人 SREENIVASAN SIDLGATA V.;XU FRANK Y.
分类号 B29C35/08;B29C33/06;B29C41/22;B29C59/02;B29C59/16;C08F2/46;C08F2/48;C08J7/18 主分类号 B29C35/08
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