发明名称 |
Method of compensating for a volumetric shrinkage of a material disposed upon a substrate to form a substantially planar structure therefrom |
摘要 |
The present invention provides a method of planarizing a substrate with a template spaced-apart from the substrate having a liquid disposed therebetween, the method including: contacting the liquid with the template forming a first shape therein; and impinging radiation upon the liquid causing a reduction in volume of the liquid, with the first shape compensating for the reduction in volume such that upon impinging the actinic radiation upon the liquid, the liquid forms a contoured layer having a substantially planar shape.
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申请公布号 |
US7244386(B2) |
申请公布日期 |
2007.07.17 |
申请号 |
US20040951014 |
申请日期 |
2004.09.27 |
申请人 |
MOLECULAR IMPRINTS, INC. |
发明人 |
SREENIVASAN SIDLGATA V.;XU FRANK Y. |
分类号 |
B29C35/08;B29C33/06;B29C41/22;B29C59/02;B29C59/16;C08F2/46;C08F2/48;C08J7/18 |
主分类号 |
B29C35/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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