Oxime derivatives and the use thereof as latent acids

摘要

New oxime sulfonate compounds of the formula I, II, III, IV, V, VI and VII R₁ is for example C₁-C₁₈alkylsulfonyl, R₂ is halogen or C₁-C₁₀haloalkyl; R₃ is for example unsubstitude or substituted phenylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl; Ar₁ is for example a direct bond, C₁-C₁₂alkylene; -O-C-bond or a -O-Si-bond which cleaves upon the action of an acid; A₁, A₂, A₃, A₄, A₅, A₆, A₇, A₈, A₉, A₁₀, A₁₁ and A₁₂ are for example a direct bond, -O-, or -S-, or are C₁-C₁₂alkylene or phenylene unsubstituted or substituted; Y₁ is C₁-C₁₂alkylene which is for example substituted by OR₄, or SR₇; Y₂ is e.g. a trivalent radical of C₁-C₁₂alkylene; Y₃ is e.g. a tetravalent radical of C₁-C₁₂alkylene; X is halogen; Ar'₁ is for example C₁-C₁₂alkyl which is unsubstituted or substituted; Ar''₁ is for example phenylene; provided that at least one of the radicals Ar'₁, Ar''₁, is substituted by 1 to 3 groups of example halogen; R₁₅, R₁₆, R₁₇ and R₁₈ e.g. hydrogen or phenyl; R₁₉, R₂₀, R₂₁, R₂₂ R₂₃ are e.g. phenyl; are especially suitable for the preparation of photoresists.