发明名称 MANUFACTURING APPARATUS FOR FILM USED MICRO OR NANO SIZE PATTERN
摘要 A manufacturing apparatus of a micro pattern film is provided to limit the position of resin by preventing the thermosetting resin or ultraviolet curing resin, patterned on the film by air pressure, from being separated outside. A manufacturing apparatus of a micro pattern film includes a pattern roller(150) which includes a rotating axis(151), a cylinder roll(152), more than two separable supporting plates(153), and a variable member(154). The cylinder roll has a micro pattern at an outer circumferential surface. The separable supporting plates are attached inside of the cylinder pattern roll, and support the cylinder pattern roll. The variable member is installed between each separable supporting plate and the rotating axis, varies toward a center of the rotating axis, and makes each separable supporting plate closely adhered to the inside of the cylinder pattern roll.
申请公布号 KR100741364(B1) 申请公布日期 2007.07.13
申请号 KR20060067289 申请日期 2006.07.19
申请人 NANOSOLUTION CO., LTD. 发明人 JE, BYUNG SUNG;PARK, SANG HOE
分类号 B29C59/04 主分类号 B29C59/04
代理机构 代理人
主权项
地址