| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for fabricating a thin film pattern and a method for fabricating a flat panel display device using the same that are adaptive for forming an organic material pattern having step coverage by not using a photolithography process to control a capacitance value of a capacitor. SOLUTION: The method for fabricating a thin film pattern includes steps of: forming a first conductive thin film pattern on a substrate; forming a master mold provided with a second thin film pattern; applying an organic material on the master mold provided with the second thin film pattern; joining the substrate and the master mold to bring the first thin film pattern and a surface of the substrate into contact with the organic material; hardening the organic material; and separating the substrate and the master mold from each other to provide an organic thin film pattern having step coverage formed by the second thin film pattern on a substrate provided with the first thin film pattern. COPYRIGHT: (C)2007,JPO&INPIT |
