| 摘要 |
PROBLEM TO BE SOLVED: To provide a member for a plasma processing apparatus having gas corrosion resistance, being excellent in sticking resistance, and suppressing abnormal discharge in a plasma process. SOLUTION: The member for the plasma processing apparatus constituting the plasma processing apparatus for performing plasma processing for a work includes a base material 2 composed of aluminum or an aluminum alloy, and an anodized film 3 formed on the surface of the base material 2. The anodized film 3 is composed as the member 1 for the plasma processing apparatus, where a leak current density exceeds 0.9×10<SP>-5</SP>(A/cm<SP>2</SP>) when an applied voltage is 100V. COPYRIGHT: (C)2007,JPO&INPIT |
