Detecting and characterizing mask blank defects using angular distribution of scattered light

摘要

An embodiment of the present invention is a technique to inspect defects in mask blanks. A first iris diaphragm is located at an illumination source to limit an illumination angle of light emitted from the illumination source. A scattering limit unit is located at exit of a dark field optical unit to limit scattering angle of the light scattered after reflecting from a mask blank. A defect analyzer is optically coupled to the dark field optical unit to generate an angular distribution of the scattered light. The angular distribution is used to characterize criticality of a defect found on the mask blank.