| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an EUV light source easy for setting a predetermined pressure difference between a discharge side and an EUV light collecting miller side without needing a great exhaust system and a debris trap. <P>SOLUTION: A chamber 1 is divided into a discharge space and a light collection space having the EUV light collection miller 3a. An aperture member 15 having an opening 15a is disposed between the spaces, and the aperture member 15 is cooled. A first and a second discharge electrodes 2a and 2b are rotated, and laser light illuminates Sn or Li. A high density and high temperature plasma is formed between both electrodes 2a and 2b by applying a pulse power between the first and second electrodes 2a and 2b, and an EUV having a wave length of 13.5 nm is radiated. The EUV light entered into the EUV light collection member 3 is collected by the EUV light collection member 3, and guided to the radiation optical system of a light exposing device. A first and a second exhaust apparatuses 5-1 and 5-2 for exhausting the discharge space and the light collection space respectively are formed to keep the pressure of the discharge space to a few Pa, and the light collection space to a few 100 Pa. <P>COPYRIGHT: (C)2007,JPO&INPIT |
