| 摘要 |
PROBLEM TO BE SOLVED: To provide a micro-structure having a structural layer increased in shearing stress, a manufacturing method thereof, and a micro-electromechanical device. SOLUTION: A sacrifice layer is formed on a substrate, a metal film is formed on the sacrifice layer, laser irradiation is formed for the metal film, needle crystal of the metal film is reduced or removed, the metal film is etched to form a metal layer of a predetermined shape, and then the sacrifice layer is removed. Thus, the micro-electromechanical device improved in resistance to rupture of a movable part of the micro-structure and excellent reliability. COPYRIGHT: (C)2007,JPO&INPIT
|
