| 摘要 |
A lithographic projection apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table configured to hold a substrate. The substrate has a surface coated at least partially with a layer of radiation sensitive material. The lithographic apparatus also includes a projection system configured to project the patterned beam onto a target portion of the substrate, and a liquid supply system. The liquid supply system is configured to supply a prewetting liquid on top of the layer of radiation sensitive material to prewet the substrate, and is configured to supply an immersion liquid in a space between the prewet substrate and at least a portion of the projection system.
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