| 发明名称 |
EXPOSURE SYSTEM, DEVICE MANUFACTURING SYSTEM, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD |
| 摘要 |
<p>A control section (6) is provided with a substrate transfer section (4) for transferring a substrate, and a plurality of exposure sections (EX1, EX2) which can perform exposure to the substrate. The control section jointly controls the substrate transfer section (4) and the exposure sections (EX1, EX2) so that the operation status of the exposure sections (EX1, EX2) is in a desired status. Both substrate use efficiency and device manufacturing efficiency are improved.</p> |
| 申请公布号 |
WO2007077901(A1) |
申请公布日期 |
2007.07.12 |
| 申请号 |
WO2006JP326159 |
申请日期 |
2006.12.27 |
| 申请人 |
NIKON CORPORATION;NARA, KEI;MIYAZAKI, SEIJI;AOKI, YASUO |
发明人 |
NARA, KEI;MIYAZAKI, SEIJI;AOKI, YASUO |
| 分类号 |
G03F7/20;H01L21/027 |
主分类号 |
G03F7/20 |
| 代理机构 |
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