| 摘要 |
PROBLEM TO BE SOLVED: To provide a rubbing apparatus which can eliminate foreign matters generated in a region near a re-alignment mechanism and can thereby prevent substrate surface from being scratched. SOLUTION: The rubbing apparatus 10 comprises a rubbing base 14 for mounting a glass substrate 13, with which a transparent electrode 11 and an alignment layer 12 are formed; a rubbing roller 15 which is adjusted so that a push-in amount to the alignment layer 12 is 0.3 mm, and which rotates and moves, while pressurizing the alignment layer 12 with a constant pressure; a rubbing cloth 17 which is wrapped around the rubbing roll 15 and has buffing fluff 16 for rubbing the alignment layer 12; a circular cylinder 18 which is adjusted so that a push-in amount to the buffing fluff 16 is 0.3 mm so as to realign the buffing fluff 16; and a suction mechanism 19 for sucking the neighborhood region of the circular cylinder 18. COPYRIGHT: (C)2007,JPO&INPIT
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