| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a thin film device such as a superconducting element or the like which is excellent in mechanical strength and useful for submillimeter wave band reception. SOLUTION: The manufacturing method comprises the steps of: forming a multilayer structure object consisting of NbN/MgO/NbN-SIS bonding on an MgO temporary substrate; forming SiO<SB>2</SB>on the multilayer structure object as a substrate; and forming the thin film device by removing the MgO temporary substrate by etching. The superconducting element (the thin film device) manufactured by the present method is easy to introduce to a wave guide for submillimeter because of excellent performance and high mechanical strength. COPYRIGHT: (C)2007,JPO&INPIT
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