发明名称 |
Photosensitive resin composition for printing substrate capable of laser sculpture |
摘要 |
A photosensitive resin composition for a laser engravable printing substrate, comprising resin (a) having a polymerizable unsaturated group whose number average molecular weight is in the range of 1000 to 20x10<SUP>4</SUP>, organic compound (b) having a polymerizable unsaturated group whose number average molecular weight is <1000 and organosilicon compound (c) having at least one Si-O bond in each molecule and having no polymerizable unsaturated group in molecules, wherein the content of organosilicon compound (c) is in the range of 0.1 to 10 wt. % based on the whole of photosensitive resin composition.
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申请公布号 |
US2007160928(A1) |
申请公布日期 |
2007.07.12 |
申请号 |
US20050587315 |
申请日期 |
2005.01.26 |
申请人 |
YAMADA HIROSHI;TOMEBA KEI |
发明人 |
YAMADA HIROSHI;TOMEBA KEI |
分类号 |
G03C1/00;B41C1/05;B41C1/10;B41N1/12;G03F7/00;G03F7/004;G03F7/027;G03F7/035;G03F7/038;G03F7/075 |
主分类号 |
G03C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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