发明名称 Photosensitive resin composition for printing substrate capable of laser sculpture
摘要 A photosensitive resin composition for a laser engravable printing substrate, comprising resin (a) having a polymerizable unsaturated group whose number average molecular weight is in the range of 1000 to 20x10<SUP>4</SUP>, organic compound (b) having a polymerizable unsaturated group whose number average molecular weight is <1000 and organosilicon compound (c) having at least one Si-O bond in each molecule and having no polymerizable unsaturated group in molecules, wherein the content of organosilicon compound (c) is in the range of 0.1 to 10 wt. % based on the whole of photosensitive resin composition.
申请公布号 US2007160928(A1) 申请公布日期 2007.07.12
申请号 US20050587315 申请日期 2005.01.26
申请人 YAMADA HIROSHI;TOMEBA KEI 发明人 YAMADA HIROSHI;TOMEBA KEI
分类号 G03C1/00;B41C1/05;B41C1/10;B41N1/12;G03F7/00;G03F7/004;G03F7/027;G03F7/035;G03F7/038;G03F7/075 主分类号 G03C1/00
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