Substrate drying apparatus and method of substrate drying using the same

摘要

A substrate drying apparatus, including a cleaning bath having a liquid supply unit, a drying tank having a gas supply unit and at least one nozzle in fluid communication with the gas supply unit, and a transfer unit for transferring a substrate from the cleaning bath to the drying tank. The apparatus of the present invention may be used in a substrate drying method, including supplying alternating dry gas mixture and inert gas to dry a substrate.