| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an apparatus for cleaning a liquid, in which the time to bring a gas into contact with the liquid which is to be treated and is supplied into a pressure-resistant vessel, is prolonged to dissolve the gas excellently in the liquid to be treated and clean efficiently the liquid to be treated, which is manufactured easily and the inside of which is maintained easily. <P>SOLUTION: The apparatus for cleaning the liquid is provided with: the pressure-resistant vessel having a vessel main body, a cover to be attached to/detached from the vessel main body, a liquid supply port and a gas supply port on the cover and a liquid discharge port in the lower part of the vessel main body; and three baffle plates the outside diameter of each of which is almost the same as the inside diameter of the vessel main body and which are fit to a fitting member and arranged in a stacked state at predetermined intervals on the inside of the cover of the pressure-resistant vessel. When the cover is attached to the vessel main body, each of baffle plates is set to have a place in a predetermined position in the upper part of the pressure-resistant vessel. <P>COPYRIGHT: (C)2007,JPO&INPIT |
