METHOD AND SYSTEM FOR USING A TWO-PHASES SUBSTRATE CLEANING COMPOUND
摘要
Cleaning compounds, apparatus, and methods to remove contaminants from a substrate surface are provided. An exemplary cleaning compound to remove particulate contaminants from a semiconductor substrate surface is provided. The cleaning compound includes a viscous liquid with a viscosity between about 1 cP to about 10,000 cP. The cleaning compound also includes a plurality of solid components dispersed in the viscous liquid, the plurality of. solid components interact with the particulate contaminants on the substrate surface to remove the particulate contaminants from the substrate surface.
申请公布号
WO2007078975(A2)
申请公布日期
2007.07.12
申请号
WO2006US48706
申请日期
2006.12.19
申请人
LAM RESEARCH CORPORATION;KOROLIK, MIKHAIL;FREER, ERIK, M.;DE LARIOS, JOHN, M.;MIKHAYLICHENKO, KATRINA;RAVKIN, MIKE;REDEKER, FRED
发明人
KOROLIK, MIKHAIL;FREER, ERIK, M.;DE LARIOS, JOHN, M.;MIKHAYLICHENKO, KATRINA;RAVKIN, MIKE;REDEKER, FRED