| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus for cleaning a liquid, in which the time to bring a gas into contact with the liquid, which is to be treated and is supplied into a pressure-resistant vessel, is prolonged to dissolve the gas excellently in the liquid to be treated and clean efficiently the liquid to be treated. SOLUTION: The apparatus for cleaning the liquid is provided with: the pressure-resistant vessel having a liquid supply port and a gas supply port in the upper part and a liquid discharge port in the lower part; and a gas supply source for supplying the gas into the pressure-resistant vessel from the gas supply port. A plurality of baffle plates, which have the same external form, each of which has a band plate projected upward at the outer circumferential edge and on each of which many down holes are formed in the positions different from those of the adjacent baffle plates, are arranged in a stacked state on the upper inside of the pressure-resistant vessel. Projections having the predetermined height are arranged in two or more positions on the upper surface of each of baffle plates. COPYRIGHT: (C)2007,JPO&INPIT
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