SUBSTRATE SUPPORT FOR INCREASING SUBSTRATE TEMPERATURE IN PLASMA REACTORS

摘要

A substrate processing system is provided. A housing (304) defines a processing chamber. A plasma (308) -generating system is operatively coupled to the processing chamber. A substrate support member (312) is disposed within the processing chamber and configured to hold a substrate (316) during substrate processing. A ceramic insert (320) is disposed over the substrate support member such that the ceramic insert is disposed between the substrate support member and the substrate during substrate processing. A gas-delivery system is configured to introduce gases into the processing chamber. A controller controls the plasma-generating system and the gas-delivery system.