LIFT-OFF PATTERNING PROCESSES EMPLOYING ENERGETICALLY-STIMULATED LOCAL REMOVAL OF SOLID-CONDENSED-GAS LAYERS
摘要
The invention provides a method for forming a patterned material layer on a structure, by condensing a vapor to a solid condensate layer on a surface of the structure and then localized removal of selected regions of the condensate layer by directing a beam of energy at the selected regions, exposing the structure at the selected regions. A material layer is then deposited on top of the solid condensate layer and the exposed structure at the selected regions. Then the solid condensate layer and regions of the material layer that were deposited on the solid condensate layer are removed, leaving a patterned material layer on the structure.
申请公布号
WO2006063098(A8)
申请公布日期
2007.07.12
申请号
WO2005US44348
申请日期
2005.12.08
申请人
THE PRESIDENT AND FELLOWS OF HARVARD COLLEGE
发明人
BRANTON, DANIEL;GOLOVCHENKO, JENE, A.;KING, GAVIN, M.;MOBERLYCHAN, WARREN, J.;SCHURMANN, GREGOR, M.