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发明名称
Composition for Resist Underlayer Film and Method for Producing the Same
摘要
申请公布号
KR100739273(B1)
申请公布日期
2007.07.12
申请号
KR20000018806
申请日期
2000.04.11
申请人
发明人
分类号
G03F7/039
主分类号
G03F7/039
代理机构
代理人
主权项
地址
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