发明名称 SUBSTRATE PROCESSING UNIT
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing unit which prevents a liquidized substance stagnated in the space formed between its outer and inner tubes from penetrating from the inner-tube supporting portion of its manifold into the inside thereof. SOLUTION: A reaction vessel of the substrate processing unit has a reaction tube comprising an outer tube 205, having a closed upper portion and an opened lower portion and an inner tube 204, having opened upper and lower portions; a manifold 209, wherein the outer and inner tubes 205, 204 of the reaction tube stand in a coaxial manner; an inner-tube support 211, provided in the manifold 209 and constituting the lower end of the space formed between the outer and inner tubes 205, 204, and having an errect section 212 for standing the inner tube 204; and an opening 233 so provided in the side surface of the manifold 209 or the outer tube 205 as to communicate with the space, for exhausting a gas rising in the inner tube 204 and falling in the space. Hereupon, there is provided an inclined surface 211a, so inclined as to descend toward the opening 233 for promoting to exhaust a liquidized substance from the opening 233, before the liquidized substance flows into the side of the errection 212 for standing the inner tube 204. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007180449(A) 申请公布日期 2007.07.12
申请号 JP20050380255 申请日期 2005.12.28
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 MARUYAMA KUNIO;YAMADA KIYOAKI;MORIKAWA HARUO
分类号 H01L21/31 主分类号 H01L21/31
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