| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a measuring method and an apparatus thereof capable of highly accurately measuring optical characteristic (wavefront aberration) of an optical system to be measured by using a simple interferometer without causing an increase in scale of an apparatus and cost rise. <P>SOLUTION: In this method, the wavefront aberration of the optical system to be measured by using interference fringes of a light from a first image surface side slit arranged on an image surface side of the optical system to be measured and having a width in the short side direction not more than a diffraction limit of the optical system to be measured, and a second image surface side slit having a width in the short side direction more than a diffraction limit of the optical system to be measured. The method has a step of acquiring a primary wavefront of the optical system to be measured in which the relative correspondence is the same in a direction vertical to a longitudinal direction between the first and second image surface side slits from the interference fringes, and a step of calculating the wavefront aberration of the optical system to be measured on the basis of the primary wavefront of the optical system to be measured acquired in the acquiring step. The acquiring step acquires the three primary wavefronts of the optical system to be measures which are measured in different measuring directions. <P>COPYRIGHT: (C)2007,JPO&INPIT |
