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发明名称
Verfahren zur Herstellung eines Siliciumwafers zur Abscheidung einer Epitaxieschicht und Epitaxiewafer
摘要
申请公布号
DE10047346(B4)
申请公布日期
2007.07.12
申请号
DE20001047346
申请日期
2000.09.25
申请人
MITSUBISHI MATERIALS SILICON CORP.
发明人
KOYA, HIROSHI;KIMURA, MASATAKA;IKEZAWA, KAZUHIRO;NAKAJIMA, KEN;KARASHIMA, TAMIYA;SHIRAKI, HIROYUKI
分类号
C30B25/18;C30B15/00;C30B15/20;C30B25/02;C30B25/20;C30B29/06;C30B33/02;H01L21/205;H01L21/322;H01L21/324
主分类号
C30B25/18
代理机构
代理人
主权项
地址
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