发明名称 |
HEAT TREATMENT SYSTEM |
摘要 |
A heat treatment system is provided to reduce a manufacturing cost and enhance spatial efficiency by heating a process gas by using a wet oxidation combustion system. A heat treatment system(1) includes a heating unit which is installed at a gas introduction path in order to heat a process gas at predetermined temperature before supplying the process gas to a reaction vessel. The gas introduction path(5) is disposed between the reaction vessel and the heating unit and includes an internal tube and an external tube. The process gas is supplied through the gas introduction path to the heating unit. The process gas is preheated at the predetermined temperature and the preheated process gas is supplied through the gas introduction path to the reaction vessel.
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申请公布号 |
KR20070074539(A) |
申请公布日期 |
2007.07.12 |
申请号 |
KR20070065375 |
申请日期 |
2007.06.29 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
ASANO TAKANOBU;ISHII KATSUTOSHI;YAMAMOTO HIROYUKI;HOSHI GEORGE;MIURA KAZUTOSHI |
分类号 |
H01L21/324;C23C16/30;C23C16/40;C23C16/44;C23C16/452;C23C16/455;C30B33/00;H01L21/00;H01L21/316 |
主分类号 |
H01L21/324 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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